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This system is being used for the deposition and structural characterization
of nano-scale metal layer on semiconductor. The vacuum is maintained ~10-9
Torr by turbo molecular pump, cold trap and ion pump to obtain a controlled
nano-scale metal layer and their RHEED patterns. This is a load-lock system
allowing faster throughput and better vacuum quality. The system has a multi-hearth
e-gun with 3-pocket crucibles and10 KW power supply, auto pump control,
substrate heaters, an ion-gun and multi-layer deposition controller. The
thickness of deposited layer is monitored using quartz crystal sensor. RHEED
system consists of 15 KV electron gun with tilt mechanism (LED110S, Thermo
VG Scientific), power supply and 8-inch fluorescent screen. |