Thermal evaporator is generally used in the deposition of electrode layer in the fabrication of devices. Deposition of titanium, aluminum, AuGe alloys and antimony are available at present. A turbo pump enables base pressures of low 10-6 Torr range. 3 tungsten boats are equipped, which can be used for sequential thin films deposition. The thickness of deposited layer can be monitored through the quartz crystal sensor. The typical pump down time is about 30 min.