The clean bench installed in our group provides a sterilized workspace for semiconductor processing such as micro-pattering, heating, or spin coating. Temperature in the clean bench is controlled from 20 to 26
Wet-processing benches is dedicated to solvent-based sample cleaning and processing, such as resist stripping, wafer cleaning, and lift-off. Exhaust is pulled through the perforated worktop. De-ionized water (D.I.) is supplied for the preparation of the sample. A Branson ultrasonic unit is also used to assist in the process. All processes are done in the semi-clean room. Solvents supplied by the laboratory are: Acetone, Isopropyl alcohol, and Trichloro Ethylene et al.